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193-nm single-layer process for 150-nm technology generation and below

Author(s):
Amblard, G. R. ( International SEMATECH and STMicroelectronics (France) )
Zandbergen, P. ( International SEMATECH and Philips Research Labs. (Netherlands) )
McCallum, M. ( International SEMATECH and Motorola )
Stephen, A. ( International SEMATECH and Advanced Micro Devices, Inc. )
Byers, J. D. ( International SEMATECH )
Dean, K. R. ( International SEMATECH )
Meute, J. ( International SEMATECH and IBM Corp. )
Nelson, C. M. ( International SEMATECH and Motorola )
3 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. date:
1999
Page(from):
810
Page(to):
827
Pages:
18
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-2
Type:
Conference Proceedings

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