Blank Cover Image

Sub-0.25-μm i-line photoresist: the role of advanced resin technology

Author(s):
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. date:
1999
Page(from):
739
Page(to):
750
Pages:
12
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-2
Type:
Conference Proceedings

Similar Items:

Sun, J., Srivastava, A., Bartholomew, R.F., Bellur, K., Osburn, C.M., Masnari, N.A.

Electrochemical Society

Jung,S.-J., Kim,H.-S., Kim,D.-G., Choi,Y.-W.

SPIE-The International Society for Optical Engineering

Alvarez, A., Lopez, S., Lopez, J.F., Sarmiento, R.

SPIE-The International Society for Optical Engineering

Beeck,M.Op de, Ronse,K., Ghandehari,K., Jaenen,P., Botermans,H., Finders,J., Lilygren,J.A., Baker,D.C., Vandenberghe,G., …

SPIE-The International Society for Optical Engineering

Pramanik, D., Weling, M., Lin, X.-W.

Electrochemical Society

Gaulhofer, E., Kruwinus, H.-.1., Kovacs, F., Haigermoser, C.

Electrochemical Society

Naeem, M.D., Yan, W., Zhu, J.

Electrochemical Society

H. J. Liu, W. H. Hsieh, C. H. Yeh, J. S. Wu, H. W. Chan, W. B. Wu, F. Y. Chen, T. Y. Huang, C. L. Shih, J. P. Lin

SPIE - The International Society of Optical Engineering

Haider, A.M., Rose, D.J., Dehord, J.R.D., Zuhoski, S.P.

Electrochemical Society

King,T.-J.

SPIE-The International Society for Optical Engineering

Sadana, D. K., Hovel, H. J., Freeouf, J. L., Chu, S. F.

MRS - Materials Research Society

Blumenthal, R., Braekelmann, G., Cave, N. G., Conner, J., Crabtree, P., Defilippi, J., Denning, D., Farkas, J., …

Materials Research Society

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12