Theoretical analysis of line-edge roughness using FFT techniques
- Author(s):
- Ohfuji, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Endo, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Morimoto, H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Publication title:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3678
- Pub. Year:
- 1999
- Page(from):
- 732
- Page(to):
- 738
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- Language:
- English
- Call no.:
- P63600/3678-2
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Analysis of molecular diffusion in resist polymer films simulated by molecular dynamics
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Temperature dependence of acid molecular diffusion in resist polymer films simulated by molecular dynamics
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Characterization of line-edge roughness in photoresist using an image fading technique
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Spatial analysis of line-edge roughness through scaling and fractal concepts using AFM techniques [6152-167]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Aerial image contrast using interferometric lithography: effect on line-edge roughness
SPIE - The International Society of Optical Engineering |