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Refractive index change during exposure for 193-nm chemically amplified resists

Author(s):
Oh, H. -K. ( Hanyang Univ. (Korea) )
Sohn, Y. -S. ( Hanyang Univ. (Korea) )
Sung, M. -G. ( Hanyang Univ. (Korea) )
Lee, Y. -M. ( Hanyang Univ. (Korea) )
Lee, E. -M. ( Hanyang Univ. (Korea) )
Byun, S. -H. ( Hanyang Univ. (Korea) )
An, I. ( Hanyang Univ. (Korea) )
Lee, K. -S. ( Hanyang Univ. (Korea) )
Park, I. -H. ( Univ. of Inchon (Korea) )
4 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
643
Page(to):
650
Pages:
8
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-1
Type:
Conference Proceedings

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