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Optimizing a DUV positive resist for metal layers

Author(s):
Malik, S. ( Arch Chemicals, Inc. )
Maxwell, B. ( Arch Chemicals, Inc. )
Gandolfi, A. ( STMicroelectronics (Italy) )
Ornaghi, A. ( STMicroelectronics (Italy) )
Whewell, A. ( Arch Chemicals, Inc. )
Uhnak, K. ( Arch Chemicals, Inc. )
Volpi, S. ( Arch Chemicals (Italy) )
Driessche, V. Van ( Arch Chemicals, N.V. (Belgium) )
Sarubbi, T. R. ( Arch Chemicals, N.V. (Belgium) )
Hansen, S. G. ( Arch Chemicals, N.V. (Belgium) )
Bowden, M. J. ( Arch Chemicals, N.V. (Belgium) )
6 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
527
Page(to):
535
Pages:
9
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-1
Type:
Conference Proceedings

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