Optimizing a DUV positive resist for metal layers
- Author(s):
Malik, S. ( Arch Chemicals, Inc. ) Maxwell, B. ( Arch Chemicals, Inc. ) Gandolfi, A. ( STMicroelectronics (Italy) ) Ornaghi, A. ( STMicroelectronics (Italy) ) Whewell, A. ( Arch Chemicals, Inc. ) Uhnak, K. ( Arch Chemicals, Inc. ) Volpi, S. ( Arch Chemicals (Italy) ) Driessche, V. Van ( Arch Chemicals, N.V. (Belgium) ) Sarubbi, T. R. ( Arch Chemicals, N.V. (Belgium) ) Hansen, S. G. ( Arch Chemicals, N.V. (Belgium) ) Bowden, M. J. ( Arch Chemicals, N.V. (Belgium) ) - Publication title:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3678
- Pub. Year:
- 1999
- Page(from):
- 527
- Page(to):
- 535
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- Language:
- English
- Call no.:
- P63600/3678-1
- Type:
- Conference Proceedings
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