Lithographic properties of novel acetal-derivatized hydroxy styrene polymers

Lithographic properties of novel acetal-derivatized hydroxy styrene polymers

Author(s):

Malik, S. ( Arch Chemicals, Inc. )

Blakeney, A. J. ( Arch Chemicals, Inc. )

Ferreira, L. ( Arch Chemicals, Inc. )

Maxwell, B. ( Arch Chemicals, Inc. )

Whewell, A. ( Arch Chemicals, Inc. )

Sarubbi, T. R. ( Arch Chemicals, Inc. )

Bowden, M. J. ( Arch Chemicals, Inc. )

Driessche, V. Van ( Arch Chemicals, N.V. (Belgium) )

Fujimori, T. ( Fuji Photo Film Co., Ltd. (Japan) )

Tan, S. ( Fuji Photo Film Co., Ltd. (Japan) )

Aoai, T. ( Fuji Photo Film Co., Ltd. (Japan) )

Uenishi, K. ( Fuji Photo Film Co., Ltd. (Japan) )

Kawabe, Y. ( Fuji Photo Film Co., Ltd. (Japan) )

Kokubo, T. ( Fuji Film-Olin Co., Ltd. (Japan) )

9 more

Publication title:

Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3678

Pub. Year:

1999

Page(from):

388

Page(to):

401

Pages:

14

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819431523 [0819431524]

Language:

English

Call no.:

P63600/3678-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014620
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Microlithography
Conf. info. (Number):	1999 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1999.03.15-1999.03.17

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