Edge lithography as a means of extending the limits of optical and nonoptical lithographic resolution

Edge lithography as a means of extending the limits of optical and nonoptical lithographic resolution

Author(s):

Holmes, S. J. ( IBM Microelectronics Div. )

Furukawa, T. ( IBM Microelectronics Div. )

Hakey, M. C. ( IBM Microelectronics Div. )

Horak, D. V. ( IBM Microelectronics Div. )

Rabidoux, P. A. ( IBM Microelectronics Div. )

Chen, K. -J. R. ( IBM Microelectronics Div. )

Huang, W. -S. ( IBM Microelectronics Div. )

Khojasteh, M. ( IBM Microelectronics Div. )

Patel, N. ( Intarsia Corp. )

4 more

Publication title:

Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3678

Pub. Year:

1999

Page(from):

348

Page(to):

359

Pages:

12

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819431523 [0819431524]

Language:

English

Call no.:

P63600/3678-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014620
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Microlithography
Conf. info. (Number):	1999 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1999.03.15-1999.03.17

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