Optimization of 193-nm single-layer resists through statistical design

Optimization of 193-nm single-layer resists through statistical design

Author(s):

Cabor, A. H. ( Arch Chemicals, Inc. )

Dimov, O. ( Arch Chemicals, Inc. )

Medina, A. N. ( Arch Chemicals, Inc. )

Neisser, M. O. ( Arch Chemicals, Inc. )

Slater, S. G. ( Arch Chemicals, Inc. )

Wang, R. H. ( Arch Chemicals, Inc. )

Houlihan, F. M. ( Lucent Technologies/Bell Labs. )

Cirelli, R. A. ( Lucent Technologies/Bell Labs. )

Dabbagh, G. ( Lucent Technologies/Bell Labs. )

Hutton, R. S. ( Lucent Technologies/Bell Labs. )

Rushkin, I. L. ( Lucent Technologies/Bell Labs. )

Sweeney, J. R. ( Lucent Technologies/Bell Labs. )

Timko, A. G. ( Lucent Technologies/Bell Labs. )

Nalamasu, O. ( Lucent Technologies/Bell Labs. )

Reichmanis, E. ( Lucent Technologies/Bell Labs. )

10 more

Publication title:

Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3678

Pub. Year:

1999

Page(from):

221

Page(to):

229

Pages:

9

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819431523 [0819431524]

Language:

English

Call no.:

P63600/3678-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014620
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Microlithography
Conf. info. (Number):	1999 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1999.03.15-1999.03.17

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