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Novel silicon-containing resists for EUV and 193-nm lithography

Author(s):
Kessel, C. R. ( 3M Co. )
Boardman, L. D. ( 3M Co. )
Rhyner, S. J. ( 3M Co. )
Cobb, J. L. ( Motorola )
Henderson, C. C. ( Sandia National Labs. )
Rao, V. ( Intel Corp. )
Okoroanyanwu, U. ( Advanced Micro Devices, Inc. )
2 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
214
Page(to):
220
Pages:
7
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-1
Type:
Conference Proceedings

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