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Block copolymers as additives: a route to enhanced resist performance

Author(s):
Sundararajan, N. ( Cornell Univ. )
Ogino, K. ( Cornell Univ. )
Valiyaveettil, S. ( Cornell Univ. )
Wang, J. ( Cornell Univ. )
Yang, S. ( Cornell Univ. )
Kameyama, A. ( Cornell Univ. )
Ober, C. K. ( Cornell Univ. )
Allen, R. D. ( IBM Almaden Research Ctr. )
Byers, J. D. ( International SEMATECH )
4 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
78
Page(to):
85
Pages:
8
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-1
Type:
Conference Proceedings

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