Chemically amplified resists based on the norbornene copolymers with steroid derivatives

Chemically amplified resists based on the norbornene copolymers with steroid derivatives

Author(s):

Kim, J. -B. ( Korea Advanced Institute of Science and Technology )

Lee, B. -W. ( Korea Advanced Institute of Science and Technology )

Kang, J. -S. ( Korea Advanced Institute of Science and Technology )

Kim, S. -J. ( Korea Kumho Petrochemical Co., Ltd. )

Park, J. -H. ( Korea Kumho Petrochemical Co., Ltd. )

Seo, D. -C. ( Korea Kumho Petrochemical Co., Ltd. )

Balk, K. -H. ( Hyundai Electronics Industries Co., Ltd. (Korea) )

Jung, J. -C. ( Hyundai Electronics Industries Co., Ltd. (Korea) )

Roh, C. -H. ( Hyundai Electronics Industries Co., Ltd. (Korea) )

4 more

Publication title:

Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3678

Pub. Year:

1999

Page(from):

36

Page(to):

43

Pages:

8

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819431523 [0819431524]

Language:

English

Call no.:

P63600/3678-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014620
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Microlithography
Conf. info. (Number):	1999 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1999.03.15-1999.03.17

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