Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms
- Author(s):
Wallow, T. I. ( IBM Almaden Research Ctr. ) Brock, P. J. ( IBM Almaden Research Ctr. ) DiPietro, R. A. ( IBM Almaden Research Ctr. ) Allen, R. D. ( IBM Almaden Research Ctr. ) Opitz, J. ( IBM Almaden Research Ctr. ) Sooriyakumaran, R. ( IBM Almaden Research Ctr. ) Hofer, D. C. ( IBM Almaden Research Ctr. ) Mewherter, A. M. ( IBM Microelectronics Div. ) Cui, Y. ( IBM Microelectronics Div. ) Yan, W. ( IBM Microelectronics Div. ) Worth, G. ( IBM Microelectronics Div. ) Moreau, W. M. ( IBM Microelectronics Div. ) Meute, J. ( International SEMATECH ) Byers, J. D. ( International SEMATECH ) Rich, G. K. ( International SEMATECH ) McCallum, M. ( International SEMATECH ) Jayaraman, S. ( BFGoodrich ) Vicari, R. ( BFGoodrich ) Cagle, J. ( BFGoodrich ) Sun, S. ( BFGoodrich ) Hullihen, K. A. ( BFGoodrich ) - Publication title:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3678
- Pub. Year:
- 1999
- Page(from):
- 26
- Page(to):
- 35
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- Language:
- English
- Call no.:
- P63600/3678-1
- Type:
- Conference Proceedings
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