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Annealing Behavior Of Locally Confined Dislocation Loops Under Inert And Oxidizing Ambient

Author(s):
Tsamis, C.
Skarlatos, D.
Raptis, I.
Tsoukalas, D.
Calvo, P.
Colombeau, B.
Cristiano, F.
Claverie, A.
3 more
Publication title:
Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
717
Pub. Year:
2002
Page(from):
243
Page(to):
248
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558996533 [1558996532]
Language:
English
Call no.:
M23500/717
Type:
Conference Proceedings

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