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Diffusion Studies Of Cu In Si And Low-K Dielectric Materials

Author(s):
Prasad, K.
Yuan, X.L.
Tan, C.M.
Zhang, D.H.
Li, C. Y.
Wang, S.R.
Yuan, S.Y.J.
Xie, J.L.
Gui, D.
Foo, P.D.
5 more
Publication title:
Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
716
Pub. date:
2002
Page(from):
395
Page(to):
400
Pages:
6
Pub. info.:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558996526 [1558996524]
Language:
English
Call no.:
M23500/716
Type:
Conference Proceedings

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