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Effect Of Ion-Accelerated Plasma Hydrogenation And Thermal Treatments On Hydrogen Silsesquioxane (HSQ) Low-K Dielectric Films

Author(s):
Publication title:
Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
716
Pub. Year:
2002
Page(from):
381
Page(to):
388
Pages:
8
Pub. info.:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558996526 [1558996524]
Language:
English
Call no.:
M23500/716
Type:
Conference Proceedings

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