Atomic Layer Deposition Of Zirconium Dioxide Thin Films Using New Alkoxide Precursors
- Author(s):
Jones, Anthony C. Williams, Paul A. Roberts, John L. Leedham, Timothy J. Davies, Hywel O. Matero, Raija Ritala, Mikko Leskela, Markku - Publication title:
- Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 716
- Pub. Year:
- 2002
- Page(from):
- 145
- Page(to):
- 150
- Pages:
- 6
- Pub. info.:
- Warrendale: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996526 [1558996524]
- Language:
- English
- Call no.:
- M23500/716
- Type:
- Conference Proceedings
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