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Evaluation Of Candidate Metals For Dual-Metal Gate Cmos With Hfo_2 Gate Dielectric

Author(s):
Samavedam, S.B.
Schaeffer, J.K.
Gilmer, D.C.
Dhandapani, V.
Tobin, P.J.
Mogab, J.
Nguyen, B-Y.
Dakshina-Murthy, S.
Rai, R.S.
Jiang, Z-X.
Martin, R.
Raymond, M.V.
Zavala, M.
La, L.B.
Smith, J.A.
Gregory, R.B.
11 more
Publication title:
Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
716
Pub. Year:
2002
Page(from):
85
Page(to):
90
Pages:
6
Pub. info.:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558996526 [1558996524]
Language:
English
Call no.:
M23500/716
Type:
Conference Proceedings

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