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A Self-Aligned Silicide Process Utilizing Ion Implants For Reduced Silicon Consumption And Control Of The Silicide Formation Temperature

Author(s):
Cohen, G.M.
Cabral, C., Jr.
Lavoie, C.
Solomon, P.M.
Guarini, K.W.
Chan, K.K.
Roy, R.A.
2 more
Publication title:
Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
716
Pub. Year:
2002
Page(from):
35
Page(to):
40
Pages:
6
Pub. info.:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558996526 [1558996524]
Language:
English
Call no.:
M23500/716
Type:
Conference Proceedings

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