Chemically Amplified Resist Approaches for E-beam Lithography Mask Fabrication

Chemically Amplified Resist Approaches for E-beam Lithography Mask Fabrication

Author(s):

Maldonado, J.R.

Publication title:

Nanopatterning : from ultralarge-scale integration to biotechnology : symposium held November 25-29, 2001, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

705

Pub. Year:

2002

Page(from):

35

Page(to):

48

Pages:

14

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558996410 [1558996419]

Language:

English

Call no.:

M23500/705

Type:

Conference Proceedings

Details

TDL ID:	ZA00014579
Series ID:	PA00000011
Conf. info. (Name):	Symposium on nanopatterning
Conf. info. (Number):	2001
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	2001.11.25-2001.11.29

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