Chemically Amplified Resist Approaches for E-beam Lithography Mask Fabrication
- Author(s):
Maldonado, J.R. Angelopoulos, M. Huang, W. Brainard, R.L. Guevremont, J.M. Tan, Z. - Publication title:
- Nanopatterning : from ultralarge-scale integration to biotechnology : symposium held November 25-29, 2001, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 705
- Pub. Year:
- 2002
- Page(from):
- 35
- Page(to):
- 48
- Pages:
- 14
- Pub. info.:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996410 [1558996419]
- Language:
- English
- Call no.:
- M23500/705
- Type:
- Conference Proceedings
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