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Spectroscopic Ellipsometry as a Potential In-Line Optical Metrology Tool For Relative Porosity Measurements of Low- K Dielectric Films

Author(s):
Edwards, N.V.
Vella, J.
Xie, Q.
Zollner, S.
Werho, D.
Adhihetty, I.
Liu, R.
Tiwald, T.E.
Russell, C.
Vires, J.
Junker, K.H.
6 more
Publication title:
Surface engineering 2001 - fundamentals and applications : symposium held November 26-29, 2001, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
697
Pub. Year:
2002
Page(from):
101
Page(to):
106
Pages:
6
Pub. info.:
Warrendale, Penn: Materials Research Society
ISSN:
02729172
ISBN:
9781558996335 [1558996338]
Language:
English
Call no.:
M23500/697
Type:
Conference Proceedings

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