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Strain Relaxation of He+ Implanted, Pseudomorphic Si1-xGex Layers on Si(100)

Author(s):
Hollander, B.
Mantl, S.
Lenk, St.
Trinkaus, H.
Kirch, D.
Luysberg, M.
Hackbarth, Th.
Herzog, H.-J.
Fichtner, P.F.P.
4 more
Publication title:
Current issues in heteroepitaxial growth--stress relaxation and self assembly : symposium held November 26-29, 2001, Boston, Massachusetts, U.S.A
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
696
Pub. Year:
2002
Page(from):
75
Page(to):
80
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558996328 [155899632X]
Language:
English
Call no.:
M23500/696
Type:
Conference Proceedings

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