
Ion Implantation Induced Interdiffusion in Quantum Wells for Optoelectronic Device Integration
- Author(s):
Fu, L. Tan, H.H. Cohen, M.I. Jagadish, C. Dao, L.V. Gal, M. Li, Na Li, Ning Liu, X. Lu, W. Shen, S.C. - Publication title:
- Progress in semiconductor materials for optoelectronic applications : symposium held November 26-29, 2001, Boston, Massachusetts, U.S.A
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 692
- Pub. date:
- 2002
- Page(from):
- 599
- Page(to):
- 606
- Pages:
- 8
- Pub. info.:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996281 [1558996281]
- Language:
- English
- Call no.:
- M23500/692
- Type:
- Conference Proceedings
Similar Items:
1
![]() SPIE-The International Society for Optical Engineering |
7
![]() SPIE-The International Society for Optical Engineering |
2
![]() SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
9
![]() SPIE-The International Society for Optical Engineering |
Materials Research Society |
10
![]() SPIE-The International Society for Optical Engineering |
5
![]() Electrochemical Society |
11
![]() SPIE - The International Society of Optical Engineering |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |