Interfacial Diffusion Studies of Hf and Zr Into Si from Thermally Annealed Hf and Zr Silicates

Interfacial Diffusion Studies of Hf and Zr Into Si from Thermally Annealed Hf and Zr Silicates

Author(s):

Quevedo-Lopez, M.A.

Publication title:

Materials issues in novel si-based technology : symposium held November 26-28, 2001, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

686

Pub. Year:

2002

Page(from):

223

Page(to):

228

Pages:

6

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558996229 [1558996222]

Language:

English

Call no.:

M23500/686

Type:

Conference Proceedings

Details

TDL ID:	ZA00014562
Series ID:	PA00000011
Conf. info. (Name):	Symposium on materials issues in novel si-based technology
Conf. info. (Number):	2001
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	2001.11.26-2001.11.28

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