Integration Challenges for Double-Gate MOSFET Technologies
- Author(s):
- Maszara, W.P.
- Publication title:
- Materials issues in novel si-based technology : symposium held November 26-28, 2001, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 686
- Pub. Year:
- 2002
- Page(from):
- 59
- Page(to):
- 68
- Pages:
- 10
- Pub. info.:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996229 [1558996222]
- Language:
- English
- Call no.:
- M23500/686
- Type:
- Conference Proceedings
Similar Items:
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
Materials Research Society |
4
Conference Proceedings
Extending Planar Single-Gate CMOS & Accelerating the Realization of Double-Gate/Multi-Gate CMOS Devices*
Electrochemical Society |
10
Conference Proceedings
Reduction of pass-gate leakage by silicon-thickness thinning in double-gate MOSFETs
Electrochemical Society |
Society of Photo-optical Instrumentation Engineers |
11
Conference Proceedings
Evaluation of ultra-thin double gate MOSFETs for the 45 nm technology node
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |