Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion

Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion

Author(s):

Publication title:

Gate stack and silicide issues in silicon processing II : symposium held April 17-19, 2001, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

670

Pub. Year:

2002

Pages:

6

Pub. info.:

Warrendale, PA: Materials Research Society

ISSN:

02729172

ISBN:

9781558996069 [1558996060]

Language:

English

Call no.:

M23500/670

Type:

Conference Proceedings

Details

TDL ID:	ZA00014553
Series ID:	PA00000011
Conf. info. (Name):	Symposium On Gate Stack And Silicide Issues in Silicon Processing
Conf. info. (Number):	2nd
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	2001.04.17-2001.04.19

Similar Items:

1 Conference Proceedings Molybdenum Gate Electrode Technology For Deep Sub-Micron CMOS Generations Ranade, Pushkar, Lin, Ronald, Lu, Qiang, Yeo, Yee-Chia, Takeuchi, Hideki, King, Tsu-Jae, Hu, Chenming Materials Research Society	7 Conference Proceedings TECHNOLOGY OPTIONS FOR DUAL METAL GATE/HIGH-K CMOS ZHANG, ZHIBO Electrochemical Society
2 Conference Proceedings Molybdenum As A Gate Electrode For Deep Sub-Micron CMOS Technology Ranade, Pusnkar, Yeo, Yee-Chia, Lu, Qiang, Takeuchi, Hideki, King, Tsu-Jae, Hu, Chenming Materials Research Society	8 Conference Proceedings Measuring The Work Functions of PVD TaN, TaSiN and TiSiN Films With a Schottky Diode CV Technique for Metal Gate CMOS Applications Pan, James, Woo, Christy, Ngo, Minh-Van, Tracy, Bryan, Adem, Ercan, Robie, Stephen, Xiang, Qi, Lin, Ming-Ren Materials Research Society
3 Conference Proceedings Impact of Gate Process Technology on EOT of HfO2 Gate Dielectric Ha, Daewon, Lu, Qiang, Takeuchi, Hideki, King, Tsu-Jae, Onishi, Katsunori, Kim, Young-Hee, Lee, Jack C. Materials Research Society	9 Conference Proceedings Process Optimization and Integration of HfO2 and Hf-Silicates Takeuchi, Hideki, King, Tsu-Jae Materials Research Society
4 Conference Proceedings Low-Temperature LPCVD MEMS Technologies Howe, Roger T., King, Tsu-Jae Materials Research Society	10 Conference Proceedings METAL GATES FOR ADVANCED CMOS TECHNOLOGIES KiTTL, J. A. 1, PAWLAK, M. A., LAUWERS, A., SCHRAM, T., POURTOIS, G., VELOSO, A., Yu, H., HOFFMANN, T., DEMEURISSE, C., … Electrochemical Society
5 Conference Proceedings Nickel Silicide Work Function Tuning Study In Metal-Gate CMOS Applications Yuan, Jun, Pan, Grant Z., Chao, Yu-Lin, Woo, Jason C. S. Materials Research Society	11 Conference Proceedings Metal gates for advanced CMOS technology Maiti,B., Tobin,P.J. SPIE - The International Society for Optical Engineering
6 Conference Proceedings A Cost-Effective CMOS Technology Utilizing Gate Work Function Control with Hafnium G. Tsutsui, H. Nakamura, T. Fukase, K. Imai Electrochemical Society	12 Conference Proceedings Short-Time Hydrogen Passivation of Poly-Si CMOS Thin Film Transistors by High Dose Rate Plasma Ion Implantation Qin, Shu, Bernstein, James D., Zhou, Yuanzhong, Liu, Wei, Chan, Chung, King, Tsu-Jae MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12