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A Study of the Deactivation of High Concentration, Laser Annealed Dopant Profiles in Silicon

Author(s):
Publication title:
Si front-end processing -- physics and technology of dopant-defect interactions III : symposium held April 17-19, 2001, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
669
Pub. Year:
2001
Pages:
6
Pub. info.:
Warrendale, PA: Materials Research Society
ISSN:
02729172
ISBN:
9781558996052 [1558996052]
Language:
English
Call no.:
M23500/669
Type:
Conference Proceedings

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