The Effect of H2 Dilution on Thin Film SiN Deposited by Hot Wire CVD Using SiH4 and NH3 Gas Mixtures

The Effect of H2 Dilution on Thin Film SiN Deposited by Hot Wire CVD Using SiH4 and NH3 Gas Mixtures

Author(s):

Dillon, A.C.

Publication title:

Amorphous and heterogeneous silicon-based films - 2001 : symposium held April 16-20, 2001, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

664

Pub. Year:

2001

Pages:

6

Pub. info.:

Warrendale: Materials Research Society

ISSN:

02729172

ISBN:

9781558996007 [1558996001]

Language:

English

Call no.:

M23500/664

Type:

Conference Proceedings

Details

TDL ID:	ZA00014547
Series ID:	PA00000011
Conf. info. (Name):	Symposium on amorphous and heterogeneous silicon-based films
Conf. info. (Number):	2001
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	2001.04.16-2001.04.20

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