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Phase Diagrams for the Optimization of rf Plasma Enhanced Chemical Vapor Deposition of a-Si:H: Variations in Plasma Power and Substrate Temperature

Author(s):
Publication title:
Amorphous and heterogeneous silicon-based films - 2001 : symposium held April 16-20, 2001, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
664
Pub. Year:
2001
Pages:
6
Pub. info.:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558996007 [1558996001]
Language:
English
Call no.:
M23500/664
Type:
Conference Proceedings

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