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Ion Implanted Er and Tb in SiO2 for Electroluminescence in MOS Diodes.

Author(s):
Publication title:
Ion beam synthesis and processing of advanced materials : symposium held November 27-29, 2000, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
647
Pub. date:
2001
Pages:
7
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558995574 [1558995579]
Language:
English
Call no.:
M23500/647
Type:
Conference Proceedings

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