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Through-Wafer Polysilicon Interconnect Fabrication with In-Situ Boron Doping

Author(s):
Publication title:
Micro- and nanosystems - materials and devices : symposium held March 28-April 1, 2005, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
872
Pub. Year:
2005
Page(from):
77
Page(to):
84
Pages:
8
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558998261 [1558998268]
Language:
English
Call no.:
M23500/872
Type:
Conference Proceedings

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