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Plasma-Assisted Atomic Layer Deposition of TiN Films at Low Process Temperature for High-Aspect Ratio Applications

Author(s):
Heil, S.B.S.
Langereis, E.
Roozeboom, F.
Kemmere, A.
Pham, N.P.
Sarro, P.M.
van-de-Sanden, M.C.M.
Kessels, W.M.M.
3 more
Publication title:
Materials, technology and reliability of advanced interconnects - 2005 : symposium held March 28-April 1, 2005, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
863
Pub. Year:
2005
Page(from):
215
Page(to):
220
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558998162 [1558998160]
Language:
English
Call no.:
M23500/863
Type:
Conference Proceedings

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