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Gate Oxide Integrity for Polysilicon Thin-Film Transistors: A Comparative Study for ELC, MILC, and SPC Crystallized Active Polysilicon Layer

Author(s):
Choi, D.C.
Choi, B.D.
Jung, J.Y.
Park, H.H.
Seo, J.W.
Lee, K.Y.
Chung, H.K.
2 more
Publication title:
Amorphous and nanocrystalline silicon science and technology - 2005 : symposium held March 28-April 1, 2005, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
862
Pub. Year:
2005
Page(from):
647
Page(to):
652
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558998155 [1558998152]
Language:
English
Call no.:
M23500/862
Type:
Conference Proceedings

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