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Application of Field-Enhanced Rapid Thermal Annealing to Activation of Doped Polycrystalline Si Thin Films

Author(s):
So, B.S.
You, Y.H.
Kirn, H.J.
Kim, Y.H.
Hwang, J.H.
D.H. Shin,
Ryu, S.R.
Choi, K.
Kim, Y.C.
4 more
Publication title:
Amorphous and nanocrystalline silicon science and technology - 2005 : symposium held March 28-April 1, 2005, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
862
Pub. date:
2005
Page(from):
275
Page(to):
280
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558998155 [1558998152]
Language:
English
Call no.:
M23500/862
Type:
Conference Proceedings

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