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Oxidation of Si nanocrystals fabricated by ultra-low energy ion implantation in thin SiO2 layers

Author(s):
Coffin, H.
Bonafos, C.
Schamm, S.
Cherkashin, N.
Respaud, M.
Ben-Assayag, G.
Dimitrakis, P.
Normand, P.
Tence, M.
Colliex, C.
Claverie, A.
6 more
Publication title:
Materials and processes for nonvolatile memories : symposium held November 30-December 2, 2004, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
830
Pub. Year:
2005
Page(from):
281
Page(to):
286
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997783 [1558997784]
Language:
English
Call no.:
M23500/830
Type:
Conference Proceedings

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