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Stress Distribution in Ultra Thin SiO2 Film/Si Substrate System Measured by a Low Level Birefringence Detection Technique

Author(s):
Publication title:
Nanoscale materials and modeling -- relations among processing, microstructure and mechanical properties : symposium held April 13-16, 2004, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
821
Pub. Year:
2004
Page(from):
169
Page(to):
174
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997714 [1558997717]
Language:
English
Call no.:
M23500/821
Type:
Conference Proceedings

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