Effect of Abrasive in Cu-CMP Slurry on Global Planarization
- Author(s):
- Publication title:
- Advances in chemical-mechanical polishing : symposium held April 13-15, 2004, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 816
- Pub. Year:
- 2004
- Page(from):
- 107
- Page(to):
- 112
- Pages:
- 6
- Pub. info.:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997660 [1558997660]
- Language:
- English
- Call no.:
- M23500/816
- Type:
- Conference Proceedings
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