Silver Patterning by Reactive Ion Beam Etching for Microelectronics Application
- Author(s):
Gao, L. Gstoettner, J. Emling, R. Wang, P. Hansch, W. Schmitt-Landsiedel, D. - Publication title:
- Materials, technology and reliability for advanced interconnects and low-k dielectrics - 2004 : symposium held April 13-15, 2004, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 812
- Pub. Year:
- 2004
- Page(from):
- 185
- Page(to):
- 190
- Pages:
- 6
- Pub. info.:
- Warrendale: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997622 [1558997628]
- Language:
- English
- Call no.:
- M23500/812
- Type:
- Conference Proceedings
Similar Items:
Materials Research Society |
7
Conference Proceedings
ASSESSMENT OF SURFACE DAMAGE OF GALLIUM ARSENIDE DUE TO REACTIVE ION ETCHING
Materials Research Society |
Trans Tech Publications |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Comparison of partially and fully depleted SOI transistors down to the sub 50-nm-gate length regime
Electrochemical Society |
Materials Research Society |
MRS-Materials Research Society |
10
Conference Proceedings
Plasma Etching and Patterning of CVD Diamond at <100。?for Microelectronics Applications
MRS - Materials Research Society |
Electrochemical Society |
11
Conference Proceedings
Use of deep reactive ion etching in the fabrication of high-efficiency high-resolution crystal x-ray analyzers
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
MRS-Materials Research Society |