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Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface

Author(s):
Barnett, Joel
Moumen, N.
Gutt, J.
Gardner, M.
Huffman, C.
Majhi, P.
Peterson, J.J.
Gopalan, S.
Foran, B.
Li, H.-J.
Lee, B.H.
Bersuker, G.
Zeitzoff, P.M.
Brown, G.A.
Lysaght, P.
Young, C.
Murto, R.W.
Huff, H.R.
13 more
Publication title:
Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
811
Pub. date:
2004
Page(from):
841
Page(to):
846
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997615 [155899761X]
Language:
English
Call no.:
M23500/811
Type:
Conference Proceedings

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