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Atomic Vapor Deposition (AVDTM) process for High Performance HfO2 Dielectric Layers

Author(s):
Cosnier, V.
Dabertrand, K.
Blonkowski, S.
Lhostis, S.
Zoll, S.
Morand, Y.
Descombes, S.
Guillaumot, B.
Hobbs, C.
Rochat, N.
Rolland, G.
Renault, O.
Garros, X.
Casse, M.
Mitard, J.
Lehnen, P.
Miedl, S.
Lindner, J.
Schumacher, M.
14 more
Publication title:
Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
811
Pub. Year:
2004
Page(from):
287
Page(to):
292
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997615 [155899761X]
Language:
English
Call no.:
M23500/811
Type:
Conference Proceedings

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