Blank Cover Image

Effects of Structural Properties of Hf-Based Gate Stack on Transistor Performance

Author(s):
Bersuker, G.
Sim, J.H.
Young, C.D.
Choi, R.
Lee, B.H.
Lysaght, P.
Brown, G.A.
Zeitzoff, P.M.
Gardner, M.
Murto, R.W.
Huff, H.R.
6 more
Publication title:
Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
811
Pub. Year:
2004
Page(from):
31
Page(to):
36
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997615 [155899761X]
Language:
English
Call no.:
M23500/811
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings SUB-NANOMETER HIGH -K GATE STACK SCALING USING THE HF-LAST/NH3 AKNEAL INTERFACE

Peterson, J., Barnett, J., Young, C., Hou, A., Gutt, J., Gopalan, S., Lee, C.H., Li, H.J., Moumen, N., Chaudhary, N., …

Electrochemical Society
7 Conference Proceedings Elfect of Deposition Sequence and Plasma Treatment on ALCVD HfO2 n-MOSFET Properties

C. Lim, Y. Kim, A. Hou, J. Gutt, S. Marcus, C. Pomarede, E. Shero, H. de Waard, C. Werkhoven, L. Chen, J. Tamim, N. …

Electrochemical Society
2 Conference Proceedings Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface

Barnett, Joel, Moumen, N., Gutt, J., Gardner, M., Huffman, C., Majhi, P., Peterson, J.J., Gopalan, S., Foran, B., Li, …

Materials Research Society
8 Conference Proceedings Identifying Contributions to Electrical Instability in High-k Gate Stacks: As-Grown vs. Generated Defects

G. Bersuker, P. Lysaght, R. Choi

Electrochemical Society
3 Conference Proceedings 17 Properties of the Interfacial Layer in the High-k Gate Stack and Transistor Performance

Bersuker, G., Peterson, J., Burnett, J., Korkin, A., Sim, J.H., Choi, R., Lee, B. H., Greer, J., Lysaght, P., Huff, H.R.

Electrochemical Society
9 Conference Proceedings Process and Manufacturing Challenges for High-K Gate Stack Systems

Gilmer, M. C., Luo, T-Y., Huff, H. R., Jackson, M. D., Kim, S., Bersuker, G., Zeitzoff, P., Vishnubhotla, L., Brown, G. …

MRS - Materials Research Society
4 Conference Proceedings Influence of the Standard CMOS Procesing on Ta2O5 Gate Dielectric Transistors Performance

Bersuker, G., Gilmer, M., Zeitzoff, P.M., Brown, G.A., Jackson, M.D., Shaapur, F., Foran, B., Huff, H.R.

Electrochemical Society
10 Conference Proceedings The Gate Stack/Shallow Junction Challenge for Sub-100 nm Technology Generations *

Huff, H.R., Brown, G.A., Larson, L.A.

Electrochemical Society
5 Conference Proceedings 51. Chargcs in HID2 ALD gate dielcetrics

Bersuker, U., Zeitzoff, P., Brown, G., Kim, Y., Hoe, A., Lin, C., Young, C., Lysoght, P., Gardner, M., Murto, R. W, …

Electrochemical Society
11 Conference Proceedings Experimental Observations of the Redistribution of Implanted Nitrogen at the Si-SiO2 Interface During RTA Processing

Lysaght, P. S., Nguyen, B., Bennett, J., Williamson, G., Torres, K., Gilmer, M., Luo, T-Y., Brady, D., Guan, J., Brown, …

MRS - Materials Research Society
6 Conference Proceedings * Sub-100 nm Gate Stack/Ultra Shallow Junction Integration Challenges

Huff, H.R., Brown, G.A., Larson, L.A., Murto, R.W.

Electrochemical Society
12 Conference Proceedings High and Low Stress Voltage Instabilities in High-K Gate Stacks

G. Bersuker, C. Young, D. Heh, R. Choi, B. Lee

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12