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An Advanced High-k Transistor Utilizing Metal-Organic Precursors in an ALD Deposition of Hafnium Oxide and Hafnium Silicate With Ozone as Oxidizer

Author(s):
Publication title:
Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
811
Pub. Year:
2004
Page(from):
25
Page(to):
30
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997615 [155899761X]
Language:
English
Call no.:
M23500/811
Type:
Conference Proceedings

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