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Effect of Ge-Rich Si1-zGez Segregation on the Morphological Stability of NiSi1-uGeu Film Formed on Strained (001) Si0.8Ge0.2 Epilayer

Author(s):
Yao, H.B.
Chi, D.Z.
Tripathy, S.
Chow, S.Y.
Wang, W.D.
Chua, S.J.
Sun, H.P.
Pan, X.Q.
3 more
Publication title:
Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
810
Pub. Year:
2004
Page(from):
165
Page(to):
170
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997608 [1558997601]
Language:
English
Call no.:
M23500/810
Type:
Conference Proceedings

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