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Current Understanding and Modeling of B Diffusion and Activation Anomalies in Preamorphized Ultra-Shallow Junctions

Author(s):
Colombeau, B.
Smith, A.J.
Cowern, N.E.B.
Pawlak, B.J.
Cristiano, F.
Duffy, R.
Claverie, A.
Ortiz, C.J.
Pichler, P.
Lampin, E.
Zechner, C.
6 more
Publication title:
Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
810
Pub. Year:
2004
Page(from):
91
Page(to):
102
Pages:
12
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997608 [1558997601]
Language:
English
Call no.:
M23500/810
Type:
Conference Proceedings

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