Blank Cover Image

On the Interface Quality of MIS Structures Fabricated From Atomic Layer Deposition of HfO2, Ta2O5 and Nb2O5-Ta2O5-Nb2O5 Dielectric Thin Films

Author(s):
Duenas, S.
Castan, H.
Garcia, H.
Barbolla, J.
Kukli, K.
Ritala, M.
Leskela, M.
2 more
Publication title:
Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
786
Pub. Year:
2004
Page(from):
147
Page(to):
152
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997240 [1558997245]
Language:
English
Call no.:
M23500/786
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Electrical Defects in Atomic Layer Deposited HfO2 Films on Silicon: Influence ofPrecursor Chemistries and Substrate Treatment

Duenas, S., Castan, H., Garcia, H., Bailon, L., KuKli, K., Ritala, M., Leskela, M.

Springer
7 Conference Proceedings Atomic layer deposition of metal thin films

Leskela, M., Aaltonen, T., Hamalainen, J., Niskanen, A., Ritala, M.

Electrochemical Society
2 Conference Proceedings Disordered Structure and Density of Gap States in High-Permittivity Thin SolidFilms

Kukli, K., Duenas, S, Garcia, H, Barbolla, J, Aarik, J., Ritala, M, Leskela, M

Springer
8 Conference Proceedings Fabrication of Ta2O5 Thin Films by Anodic Oxidation of Tantalum Nitride and Tantalum Silicide: Growing Mechanisms, Electrical Characterization and ULSI M-I-M …

Duenas, S., Castan, H., Barbolla, J., Kola, R. R., Sullivan, P. A.

MRS - Materials Research Society
3 Conference Proceedings Atomic Layer Deposition of Thin Films for Microelectronics

Ritala, M., Leskela, M.

Electrochemical Society
9 Conference Proceedings Conductance Transient Comparative Analysis of ECR-PECVD Deposited SiNx, SiO2/SiNx and SiOxNy Dielectric Films on Silicon Substrates

Castan, H., Duenas, S., Barbolla, J., Del Prado, A., San Andres, E., Martil, I., Gonzalez-Diaz, G.

Materials Research Society
4 Conference Proceedings Atomic layer deposition of dielectric Nb2O5 films using the NbI5-O2 precursor combination

Rooth, M., Kukli, K., Harsta, A.

Electrochemical Society
10 Conference Proceedings Solid Solution CdxZn1-xS Thin Films Grown by Atomic Layer Epitaxy and Successive Ionic Layer Adsorption and Reaction Techniques

Valkonen,M.P., Ritala,M., Lindroos,S., Leskela,M.

Trans Tech Publications
5 Conference Proceedings Dielectric Oxide Nanolaminates Deposited by Atomic Layer Epitaxy

Kukli, K., Ritala, M., Leskela, M.

Electrochemical Society
11 Conference Proceedings Atomic Layer Deposited Protective Layers

M. Leskela, E. Salmi, M. Ritala

Trans Tech Publications
6 Conference Proceedings Atomic Layer Deposition of Metal Oxide Films by using Metal Alkoxides as an Oxygen Source

Raeisaenen, P.I., Kukli, K., Rahtu, A., Ritala, M., Leskela, M.

Electrochemical Society
12 Conference Proceedings Atomic Layer Deposited Protective Layers

M. Leskela, E. Salmi, M. Ritala

Trans Tech Publications
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12