High Remanent Polarization in Laser Ablated SrBi2Nb2O9 Thin Films

High Remanent Polarization in Laser Ablated SrBi2Nb2O9 Thin Films

Author(s):

Publication title:

Advanced optical processing of materials : sympoisum held April 22-23, 2003, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

780

Pub. Year:

2003

Page(from):

33

Page(to):

38

Pages:

6

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558997172 [1558997172]

Language:

English

Call no.:

M23500/780

Type:

Conference Proceedings

Details

TDL ID:	ZA00014438
Series ID:	PA00000011
Conf. info. (Name):	Symposium on multiscale phenomena in materials
Conf. info. (Number):	2003
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	2003.04.22-2003.04.23

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