A New Pathway for Si Nanocrystal Formation: Oxi-Reduction Induced by Impurity Implantation

A New Pathway for Si Nanocrystal Formation: Oxi-Reduction Induced by Impurity Implantation

Author(s):

Jacobsohu, L. G.

Publication title:

Nanostructuring materials with energetic beams : symposium held April 22-23, 2003, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

777

Pub. Year:

2003

Page(from):

9

Page(to):

14

Pages:

6

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558997141 [1558997148]

Language:

English

Call no.:

M23500/777

Type:

Conference Proceedings

Details

TDL ID:	ZA00014435
Series ID:	PA00000011
Conf. info. (Name):	Symposium on unconventional approaches to nanostructures with applications in electronics, photonics, information storage and sensing
Conf. info. (Number):	2003
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	2003.04.22-2003.04.23

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