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Material and Electrical Characterization of HfO2 Films for MIM Capacitors Application

Author(s):
Hu, Hang
Zhu, Chunxiang
Lu, Y. F.
Wu, Y. H.
Liew, T.
Li, M. F.
Cho, B. J.
Choi, W. K.
Yakovlev, N.
4 more
Publication title:
Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics-2003 : symposium held April 21-25, 2003, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
766
Pub. Year:
2003
Page(from):
363
Page(to):
372
Pages:
10
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997035 [1558997032]
Language:
English
Call no.:
M23500/766
Type:
Conference Proceedings

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