Blank Cover Image

Effects of Supercritical CO2 Drying and Photoresist Strip on Low-k Films

Author(s):
Publication title:
Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics-2003 : symposium held April 21-25, 2003, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
766
Pub. Year:
2003
Page(from):
303
Page(to):
308
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997035 [1558997032]
Language:
English
Call no.:
M23500/766
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Supercritical Carbon Dioxide-Based Fluids Used as a Recovery Tool for Low-k Materials

Orozco-Teran, Rosa A., Gorman, Brian P., Zhang, Zhengping, Mueller, Dennis W., Reidy, Richard F.

Materials Research Society
7 Conference Proceedings Effect of Montmorillonite on Formation of Polystyrene Foams Using Supecritical CO2

Strauss, W., Paceley, M., D'Souza, N.A., Ranade, A.J., Reidy, R.F.

Society of Plastics Engineers
2 Conference Proceedings Functionalized Silica Aerogels/Xerogels for Low Dielectric Constant Applications

Dong, H., Orozco-Teran, R.A., Roepsch, J.A., Mueller, D.W., Reidy, R.F.

Electrochemical Society
8 Conference Proceedings Analysis of biomodulative effects of low-intensity laser on human skin fibroblast cells using fiber optic nano-probes

A. Dutta, K. Mitra, M. S. Grace, R. W. Waynant, D. B. Tata, E. Gorman, J. Anders

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Synthesis and Characterization of Hydrophobic Fluorinated Silica Xerogel Films

Zhang, Z., Dong, H., Gorman, B.P., Yao, C., Mueller, D.W., Reidy, R.F

Electrochemical Society
9 Conference Proceedings Supercritical CO2 Treatments for Semiconductor Applications

Gangopadhyay, S., Lubguban, J.A., Lahlouh, B., Sivaraman, G., Biswas, K., Rajagopalan, T., Biswas, N., Kim, H.-C., …

Materials Research Society
4 Conference Proceedings Observation of Intrusion Rates of Hexamethyldisilazane during Supercritical Carbon Dioxide Functionalization of Triethoxyfluorosilane Low-k Films

Capani, P.M., Matz, P.D., Mueller, D.W., Kim, M.J., Walter, E.R., Rhoad, J.T., Busch, E.L., Reidy, R.F.

Materials Research Society
10 Conference Proceedings GATE OXIDE DAMAGE IN DRY PHOTORESIST STRIPPING ENVIRONMENTS

Sibbett, Karen H., Ulacia, Ignacio J., McVittie, James P., Reichelderfer, Richard F.

Materials Research Society
5 Conference Proceedings PHOTORESIST STRIPPING USING SUPERCRITICAL CO2 - BASED PROCESSES

Perrut, V., Danel, A., Millet, C., Daviot, J., Rignon, M., Tardif, F.

Electrochemical Society
11 Conference Proceedings Supercritical fluid processing: a new dry technique for photoresist developing

P.M. Gallagher-Wetmore, G.M. Wallraff, R.D. Allen

Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings CHEMICAL FORMULATIONS FOR STRIPPING POST-ETCH PHOTORESIST ON A LOW-к FILM IN SUPERCRITICAL CARBON DIOXIDE

M. B. Korzenski, T. H. Baum, K. Saga, H. Kuniyasu, T. Hattori

Electrochemical Society
12 Conference Proceedings Characterization and light emission properties of osmium silicides synthesized by low energy ion implantation

P. R. Poudel, K. Hossain, J. Li, B. Gorman, A. Neogi, B. Rout, J. L. Duggan, F. D. McDaniel

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12