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Development and Application of On-Wafer Small Angle X-ray Scattering for the Quantification of Pore Morphology in Low-k Porous SiLKTM Semiconductor Dielectrics

Author(s):
Landes, Brian
Kern, Brandon
Stokich, Ted
Niu, Jason
Yontz, Dorie
Radler, Mike
Mohler, Carol
Ouellette, Kacee
Lucero, Sebring
Hahnfeld, Jerry
King, Danny
Quintana, John
Weigand, Steve
8 more
Publication title:
Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics-2003 : symposium held April 21-25, 2003, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
766
Pub. Year:
2003
Page(from):
209
Page(to):
216
Pages:
8
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997035 [1558997032]
Language:
English
Call no.:
M23500/766
Type:
Conference Proceedings

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