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Relaxation of SiGe Films for the Fabrication of Strained Si Devices

Author(s):
Maa, J. S.
Tweet, D. J.
Lee, J. J.
Hsu, S. T.
Fujii, K.
Naka, T.
Ueda, T.
Baba, T.
Awaya, N.
Sakiyama, K.
5 more
Publication title:
CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
765
Pub. Year:
2003
Page(from):
135
Page(to):
140
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997028 [1558997024]
Language:
English
Call no.:
M23500/765
Type:
Conference Proceedings

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